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发明人高志强,罗永刚,郑宇鹏. "A Process for Preparing High-Purity 2-Propenoic acid, polymer with ethyl 2-propenoate and N-(hydroxymethyl)-2-propenamide" [P]. 中国发明专利, 专利号 CN 111168762 B, 授权公告日 2025-12-23.
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